Chung-hwan Shin

Title: Innovations by Chung-hwan Shin in Semiconductor Technology

Introduction

Chung-hwan Shin is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Chung-hwan Shin's latest patents involve innovative semiconductor devices that include advanced resistor structures. One of his patents describes a semiconductor device that features a substrate with an upper surface perpendicular to a first direction. This device incorporates a resistor structure that consists of a first insulating layer on the substrate, a resistor layer on the first insulating layer, and a second insulating layer on the resistor layer. A resistor contact penetrates the second insulating layer and the resistor layer, with the tilt angle of the side wall of the resistor contact varying according to its height from the substrate. This design results in a semiconductor device that boasts low contact resistance and minimal variation in contact resistance.

Career Highlights

Chung-hwan Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to the development of cutting-edge devices.

Collaborations

Throughout his career, Chung-hwan Shin has collaborated with talented individuals such as Tae-Yeol Kim and Hyon-wook Ra. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies in the semiconductor field.

Conclusion

Chung-hwan Shin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.