This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003.
Company Filing History:
Years Active: 2003
Title: Innovations of Chung-Hung Lu in Semiconductor Fabrication
Introduction
Chung-Hung Lu is a notable inventor based in Win Lin County, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly in improving photolithography processes. His innovative approach has led to advancements that enhance the efficiency and effectiveness of integrated circuit devices.
Latest Patents
Chung-Hung Lu holds a patent for a Dielectric ARC scheme aimed at improving the photo window in the dual damascene process. This invention focuses on a method of fabrication used for semiconductor integrated circuit devices. Specifically, it enhances the photolithography processing window of a multi-layered dual damascene process by utilizing a dielectric anti-reflective coating (DARC) made of multiple layers of silicon oxynitride (SiON). By varying the dielectric constant values and thickness of these layers, the invention reduces reflectivity and improves light absorption. This optimization of optical properties leads to better performance in semiconductor manufacturing.
Career Highlights
Chung-Hung Lu is associated with Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of photolithography in the industry.
Collaborations
Chung-Hung Lu has collaborated with notable colleagues, including Ya-Li Tai and Kwang-Ming Lin. Their combined efforts contribute to the ongoing innovation in semiconductor fabrication processes.
Conclusion
Chung-Hung Lu's contributions to semiconductor technology, particularly through his patented innovations, demonstrate his commitment to advancing the field. His work continues to influence the efficiency of integrated circuit devices, marking him as a significant figure in the industry.