Chung-Hsing Chana

Title: Innovations of Chung-Hsing Chana

Introduction

Chung-Hsing Chana is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the fabrication process of phase shift masks.

Latest Patents

Chung-Hsing Chana holds a patent for a method titled "Dual trench alternating phase shift mask fabrication." This patent involves the fabrication of a dual-trench alternating phase shift mask (PSM). The process includes patterning a chromium layer over a mask layer, which is situated above a quartz layer. The mask layer is dry etched according to deep trenches of a PSM design. The quartz layer undergoes multiple dry etching processes through photoresist layers, utilizing backside ultraviolet exposure to achieve precise patterns.

Career Highlights

Chung-Hsing Chana is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to advancements in semiconductor manufacturing techniques. His innovative approach has positioned him as a key figure in the development of new technologies.

Collaborations

Chung-Hsing Chana has collaborated with notable colleagues, including San-De Tzu and Ming-Shuo Yen. These collaborations have fostered an environment of innovation and have led to the successful development of advanced semiconductor technologies.

Conclusion

Chung-Hsing Chana's contributions to the field of semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.