This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations by Chung Hsien Liao
Introduction
Chung Hsien Liao is an inventor based in Hsinchu City, Taiwan. He has made significant contributions to the field of semiconductor technology. Although he currently holds no granted patents, his work in developing innovative systems and methods for film deposition and monitoring precursor tanks is noteworthy.
Latest Patent Applications
Chung Hsien Liao's latest patent applications include two significant innovations. The first is a "SEMICONDUCTOR APPARATUS FOR GAS MIXING AND METHOD OF FILM DEPOSITION." This apparatus is designed for performing film deposition or etching operations and includes a chamber, a substrate holder, a gas dispenser, and a uniquely designed passage for gas injection. The second application is for a "SYSTEM AND METHOD OF MONITORING PRECURSOR TANK." This system features a sensor and signal processor that monitor the remaining precursor amount in a tank during deposition processes, thereby enhancing operational efficiency and safety.
Conclusion
Chung Hsien Liao's innovative approaches in semiconductor technology demonstrate his potential impact on the industry. His latest patent applications reflect a commitment to advancing methods in film deposition and monitoring systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile