Hsinchu, Taiwan

Chung-Chih Liu

This inventor holds 1 USPTO granted patent. Top assignee: Promos Technologies, Inc. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Chih Liu. Retrieved from https://idiyas.com/inventor/chung-chih-liu-1zykva12

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Chung-Chih Liu

Introduction

Chung-Chih Liu is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of silicon nitride formation.

Latest Patents

Chung-Chih Liu holds a patent for a method titled "Method for preventing native oxide growth during nitridation." This innovative method involves forming a layer of silicon nitride by providing at least one silicon wafer in a substantially enclosed chamber with ammonia gas. The silicon wafer reacts with the ammonia gas to create a first layer of silicon nitride. Subsequently, the wafer is moved to a second chamber where a second layer of silicon nitride is formed.

Career Highlights

Chung-Chih Liu is currently employed at Promos Technologies, Inc., where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in improving the efficiency and effectiveness of silicon wafer processing.

Collaborations

Chung-Chih Liu collaborates with various professionals in his field, including his coworker Cheng-Che Lee. Their combined expertise contributes to the innovative projects at Promos Technologies, Inc.

Conclusion

Chung-Chih Liu's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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