Chung-Chiang Lin

Title: Innovations of Chung-Chiang Lin in Semiconductor Technology.

Introduction

Chung-Chiang Lin is a notable inventor based in Qonglin, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure and its forming method.

Latest Patents

Chung-Chiang Lin holds 1 patent for his invention titled "Semiconductor structure and forming method thereof." This patent discloses a semiconductor structure that includes deep trench capacitors formed in a substrate. The invention also describes a method of forming these structures, where fin contacts created by the upper portions of inner electrodes in the deep trench capacitors connect to fins on the substrate's surface. Additionally, the patent outlines that at least one of the word lines formed on the substrate passes over and is separated by a word line isolation layer from the inner electrodes. The word line isolation layer covers portions of the inner electrodes between a buried oxide layer and the fin contacts, while the fins remain exposed.

Career Highlights

Chung-Chiang Lin is currently associated with Hefechip Corporation Limited, where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.

Collaborations

Chung-Chiang Lin collaborates with talented individuals such as Liang Li and Chunyu Wong. Their combined expertise contributes to the innovative projects at Hefechip Corporation Limited.

Conclusion

Chung-Chiang Lin's contributions to semiconductor technology exemplify the impact of innovation in the field. His patent and ongoing work at Hefechip Corporation Limited highlight his role as a key inventor in advancing semiconductor structures.