Taipei, Taiwan

Chung-Cheng Lin

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Cheng Lin. Retrieved from https://idiyas.com/inventor/chung-cheng-lin-dr3bwdzi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Chung-Cheng Lin

Introduction

Chung-Cheng Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method that enhances the reliability of solder bumps in electronic devices.

Latest Patents

Chung-Cheng Lin holds a patent for a method of processing solder bump by vacuum annealing. This method involves vacuum annealing on a substrate that has at least one solder bump. The process aims to reduce voids at the interface of the solder bump, thereby improving the overall performance and durability of electronic components.

Career Highlights

Chung-Cheng Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His work at this leading semiconductor manufacturer has allowed him to be at the forefront of technological advancements in the industry. He has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Chung-Cheng Lin has collaborated with esteemed colleagues such as Hsiu-Jen Lin and Chung-Shi Liu. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Chung-Cheng Lin's contributions to the field of semiconductor technology are noteworthy. His innovative methods and collaborative efforts continue to shape the future of electronic manufacturing. His work exemplifies the importance of innovation in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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