Taitung, Taiwan

Chung-Chen Hsu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Winbond Electronics Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Chen Hsu. Retrieved from https://idiyas.com/inventor/chung-chen-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of Chung-Chen Hsu in Semiconductor Technology

Introduction

Chung-Chen Hsu is a notable inventor based in Taitung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of photo-masks used in ion implantation processes.

Latest Patents

Chung-Chen Hsu holds a patent titled "Methods for forming a photo-mask and a semiconductor device." This innovative method involves providing a first pattern that includes a first light-transmitting region and a first light-shielding region. The process transforms this first pattern into a second pattern, which has a smaller light-transmitting region and a larger light-shielding region. The resulting photo-mask is crucial for the ion implantation process of a material layer. He has 1 patent to his name.

Career Highlights

Chung-Chen Hsu is currently employed at Winbond Electronics Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Chung-Chen Hsu has collaborated with notable colleagues such as Chun-Hung Lin and Ching-Chun Huang. Their combined expertise has contributed to the success of various projects within the semiconductor industry.

Conclusion

Chung-Chen Hsu's innovative work in semiconductor technology, particularly in photo-mask development, showcases his significant impact on the field. His contributions continue to influence advancements in semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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