Chung-An Lin

Title: Innovations of Chung-An Lin

Introduction

Chung-An Lin is a notable inventor based in Hsin-chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 3 patents, Lin has demonstrated his expertise and commitment to advancing technology.

Latest Patents

One of Lin's latest patents is a method of reducing spiral defects by adding an isopropyl alcohol rinse. This method describes a process for forming an interlevel dielectric layer of spin-on-glass that effectively avoids spiral defects. By depositing isopropyl alcohol on a spinning wafer at a low angular velocity, followed by the application of spin-on-glass, Lin's technique ensures a defect-free layer.

Another significant patent is the capped reflow process to avoid contact autodoping and suppress tungsten silicide peeling. This invention provides a method to protect contact areas during the reflow cycle for borophosphosilicate glass insulating layers. By using a thin oxide layer, Lin's method prevents autodoping and peeling while allowing satisfactory reflow, thus enhancing the reliability of large-scale integrated circuits.

Career Highlights

Chung-An Lin works at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has been instrumental in developing processes that improve the quality and efficiency of semiconductor fabrication.

Collaborations

Lin collaborates with talented individuals such as Ting-Hwang Lin and Ying-Chen Chao, contributing to a dynamic and innovative work environment.

Conclusion

Chung-An Lin's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.