The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 1995
Filed:
Oct. 11, 1994
Taiwan Semiconductor Manufacturing Company, Hsinchu, TW;
Abstract
Disclosed is a method of integrated circuit manufacture involving a method for optimizing the time needed to outgas a layer of spin-on-glass. A layer of spin-on-glass that was previously covered over may be exposed again as a result of subsequent processing. It is necessary to subject such a layer to an outgassing treatment by heating it in vacuum prior to the deposition of a metal film which could react with any ougassed material that was not already removed. To avoid having to heat the integrated circuit for any longer than is absolutely necessary during outgassing, the partial pressure of the outgassed material is monitored by means of a residual gas analyzer whose output is used to control the outgassing process.