San Jose, CA, United States of America

Chun-Yung Ai

This inventor holds 1 USPTO granted patent. Top assignee: Omnivision Technologies, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun-Yung Ai. Retrieved from https://idiyas.com/inventor/chun-yung-ai-bebfwegn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Chun-Yung Ai

Introduction

Chun-Yung Ai is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology. His work focuses on enhancing the performance and efficiency of pixel array substrates.

Latest Patents

Chun-Yung Ai holds a patent for a "Backside deep trench isolation structure for leakage suppression." This innovative design includes a semiconductor substrate with a pixel array, a guard ring region, and a deep trench isolation (DTI) structure. The DTI structure is specifically configured to block electric current paths, thereby improving the overall functionality of the device.

Career Highlights

Chun-Yung Ai is currently employed at Omnivision Technologies, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise has led to advancements that benefit various applications in imaging and sensor technologies.

Collaborations

Throughout his career, Chun-Yung Ai has collaborated with talented professionals such as Kazufumi Watanabe and Chih-Wei Hsiung. These collaborations have fostered innovation and contributed to the success of their projects.

Conclusion

Chun-Yung Ai's contributions to semiconductor technology, particularly through his patented innovations, highlight his role as a key figure in the industry. His work continues to influence advancements in imaging technologies and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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