This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: United Microelectronics Corp.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Chun-Yi Chang: Innovator in Photomask Technology
Introduction
Chun-Yi Chang is an inventor based in Taichung, Taiwan. He is known for his contributions to the field of photomask technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.
Latest Patent Applications
Chun-Yi Chang has submitted several notable patent applications. One of his applications is titled "PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERN." This application describes a photomask set that includes a first photomask and a second photomask. The first photomask features a first pattern that consists of a first main portion and a first stitching portion. The first stitching portion includes a first matching portion and a first overlapping portion. The second photomask contains a second pattern, which also includes a second main portion and a second stitching portion. The second stitching portion comprises a second matching portion and a second overlapping portion. The application details how the first photomask aligns with the second photomask, ensuring that the first matching portion matches the second matching portion, and the overlapping portions align correctly.
Another significant application is "OPTIMIZATION METHOD FOR MASK PATTERN OPTICAL TRANSFER." This method outlines a process for optimizing mask pattern optical transfer. It begins with a projection optical simulation to determine an optimal pupil configuration scheme for a virtual mask pattern. Following this, a position scanning is conducted to adjust the optimal pupil configuration scheme, generating multiple adjusted schemes. A mask pattern transfer simulation is then performed to obtain critical dimension relationship data. Finally, an actual pupil configuration scheme is selected for the actual mask pattern based on the data obtained.
Conclusion
Chun-Yi Chang is an innovative inventor whose work in photomask technology showcases his potential in the field. His latest patent applications reflect a commitment to advancing technology, even in the absence of granted patents.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile