This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: **Chun-Lung Lin: Innovator in Ultraviolet Curing Technology**
Introduction
Chun-Lung Lin is a distinguished inventor based in Changhua County, Taiwan. He has made significant contributions to the field of ultraviolet curing technology, showcasing his innovative spirit through a notable patent. With his expertise in this unique area, Lin continues to impact the manufacturing processes, particularly within the semiconductor industry.
Latest Patents
Chun-Lung Lin holds a patent for an "Ultraviolet curing apparatus having top liner and bottom liner made of low-coefficient of thermal expansion material." This advanced ultraviolet curing apparatus features a chamber, a gas flow generator, and an ultraviolet lamp designed to enhance efficiency and precision during the curing process. The innovation lies in using a low-coefficient of thermal expansion material for both the top and bottom liners, ensuring stability and reliability throughout operations.
Career Highlights
Lin's career is marked by his tenure at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he has innovated within an environment that prides itself on cutting-edge technology and advancements in semiconductor manufacturing. His work contributes to the company's reputation as a global leader in the semiconductor industry.
Collaborations
Throughout his career, Chun-Lung Lin has collaborated with talented colleagues, including Teng-Da Hung and Liang-Chang Hsieh. These partnerships have fostered an innovative environment where ideas are exchanged and developed into groundbreaking technologies, enhancing the field of ultraviolet curing systems.
Conclusion
Chun-Lung Lin exemplifies the spirit of innovation, bringing forth technological advancements that significantly benefit the semiconductor industry. His patent highlights an important leap in ultraviolet curing technology, showcasing both his creativity and technical prowess. With continued collaboration and innovation, Lin is poised to make even greater contributions in the future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile