Company Filing History:
Years Active: 2004-2005
Title: Innovations by Inventor Chun-Lin Wu
Introduction
Chun-Lin Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing processes of integrated circuits. With a total of 2 patents to his name, his work has had a considerable impact on the industry.
Latest Patents
Chun-Lin Wu's latest patents include a "Method and system for determining a component concentration of an integrated circuit feature." This method involves collecting intensity data representative of spectral wavelengths of radiant energy generated by a plasma during plasma nitridation of an integrated circuit feature. The analysis of this intensity data allows for the determination of a peak intensity at one of the wavelengths, which is crucial for assessing the component concentration of the feature.
Another significant patent is the "Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication." This disclosure outlines a comprehensive method for forming a gate stack structure for semiconductor devices. The process includes forming a dielectric layer on a substrate, applying a plasma nitridation process, and conducting a series of anneal processes. The etching step ensures that the top portion of the dielectric layer has a higher concentration of nitrogen, which effectively reduces leakage current.
Career Highlights
Chun-Lin Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop innovative solutions that enhance the performance and reliability of integrated circuits.
Collaborations
Chun-Lin Wu has collaborated with notable colleagues such as Chi-Chun Chen and Shih-Chang Chen. Their combined expertise has contributed to advancements in semiconductor technology.
Conclusion
Chun-Lin Wu's contributions to the field of semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor. His innovative methods continue to shape the future of integrated circuit fabrication.