Chun-Li Lo

Title: Innovations of Chun-Li Lo

Introduction

Chun-Li Lo is a notable inventor based in West Lafayette, IN (US). He has made significant contributions to the field of integrated circuits, particularly in the area of diffusion barriers. With a total of 2 patents, his work has implications for enhancing the performance and reliability of electronic devices.

Latest Patents

Chun-Li Lo's latest patents focus on ultra-thin diffusion barriers. The first patent describes a method of providing a barrier to diffusion of metal into a dielectric in a metal interconnect arrangement. This involves forming a damascene trench with a dielectric base, depositing two-dimensional diffusion barrier layers over the trench, and then adding a conductor layer atop the diffusion layer. The barrier layers are designed to prevent the diffusion of constituents from the conductor layer into the dielectric base. The materials used for these barrier layers include polycrystalline substances such as TaSe, TaTe, TiS, TiSe, TiTe, and TaS, with specific parameters for their composition.

The second patent also addresses a metal interconnect arrangement in an integrated circuit. It includes similar features as the first patent, emphasizing the importance of the two-dimensional diffusion barrier layers in maintaining the integrity of the dielectric base.

Career Highlights

Chun-Li Lo is affiliated with the Purdue Research Foundation, where he continues to innovate and contribute to advancements in technology. His work is crucial in the development of more efficient electronic components, which are essential in today's fast-paced technological landscape.

Collaborations

Chun-Li Lo collaborates with Zhihong Chen, enhancing the research and development efforts in their field. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Chun-Li Lo's contributions to the field of integrated circuits through his patents on ultra-thin diffusion barriers highlight his role as a significant inventor. His work not only advances technology but also sets the stage for future innovations in electronic devices.