This inventor holds 1 USPTO granted patent. Top assignee: National Chung Shan Institute of Science and Technology. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Innovations of Chun-Ho Chen in Impact-Absorptive Materials
Introduction
Chun-Ho Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in developing methods for creating impact-absorptive materials. His innovative approach has the potential to enhance safety in various applications.
Latest Patents
Chun-Ho Chen holds a patent for a "Method for making impact-absorptive material." This method involves mixing silicon dioxide (SiO) particles, polydimethylsiloxane (PDMS), and an appropriate amount of an additive. The mixture is allowed to settle until tiny bubbles are evenly distributed, forming a colloidal solution raw material. A crosslinking agent is then added to this solution to create a colloidal solution plastic material. The material is filled into a die and heated, resulting in an effective impact-absorbing material that can be produced quickly and at low costs. This innovation is particularly useful in physical education, medicine, transportation, and safety-enhancing equipment.
Career Highlights
Chun-Ho Chen is affiliated with the National Chung Shan Institute of Science and Technology, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications and innovative methodologies.
Collaborations
Chun-Ho Chen collaborates with talented individuals such as Chin-Wei Chun and Chin-Tsai Li, contributing to a dynamic research environment that fosters innovation.
Conclusion
Chun-Ho Chen's contributions to the field of impact-absorptive materials demonstrate his commitment to innovation and safety. His patented method represents a significant advancement in material science, with wide-ranging applications that can benefit various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile