The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Jul. 17, 2014
National Chung Shan Institute of Science and Technology;
Teh-Long Lai, New Taipei, TW;
Chun-Ho Chen, New Taipei, TW;
Chin-Wei Chun, New Taipei, TW;
Chin-Tsai Li, New Taipei, TW;
Abstract
A method for making an impact-absorptive material is introduced. The method involves mixing silicon dioxide (SiO) particles, polydimethylsiloxane (PDMS), and an appropriate amount of an additive, allowing the mixture to settle until tiny bubbles in the mixture are evenly distributed, thereby forming a colloidal solution raw material, adding a crosslinking agent to the colloidal solution raw material to form a colloidal solution plastic material, filling a die with the colloidal solution plastic material, heating the colloidal solution plastic material in the die such that it takes shape and forms an effective impact absorbing material, quickly and at low costs, for use in physical education, medicine, transportation, and safety-enhancing equipment.