This inventor holds 1 USPTO granted patent. Top assignee: Jusung Engineering Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Innovations of Chun-Hee Lee in Etching Mask Technology
Introduction
Chun-Hee Lee is a notable inventor based in Gyeongsangbuk-do, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of etching mask technology. His innovative approach has led to the filing of a patent that enhances the efficiency and effectiveness of etching processes.
Latest Patents
Chun-Hee Lee holds a patent for a "Method of forming etching mask." This invention relates to a method that involves several key steps. The process includes depositing a hard mask film containing silicon on a substrate, followed by the deposition of a photoresist on the hard mask film. The photoresist is then patterned, and the hard mask film is etched using the photoresist pattern as a mask. Notably, the etching gas used includes a CHF(x, y=1, 2, 3) gas. The invention also emphasizes increasing the etch selectivity of the hard mask film to the photoresist pattern by utilizing a mixed gas that includes CHF and Hgases when etching under a wavelength of 193 nm or less. Chun-Hee Lee has 1 patent to his name.
Career Highlights
Chun-Hee Lee is currently associated with Jusung Engineering Co., Ltd., a company known for its advancements in semiconductor equipment and technology. His work at the company has been instrumental in pushing the boundaries of etching technology, contributing to the overall progress in the semiconductor industry.
Collaborations
Chun-Hee Lee has collaborated with several professionals in his field, including Gi-Chung Kwon and Nae-Eung Lee. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Chun-Hee Lee's contributions to etching mask technology exemplify the importance of innovation in the semiconductor industry. His patent and ongoing work at Jusung Engineering Co., Ltd. highlight his role as a key figure in advancing manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile