Chun-Han Lin

Title: Innovations of Chun-Han Lin in EUV Lithography

Introduction

Chun-Han Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of lithography systems.

Latest Patents

Chun-Han Lin's latest patents include a device and method to remove debris from an extreme ultraviolet (EUV) lithography system. This innovative method involves irradiating debris deposited in the EUV lithography system with a laser. By controlling the wavelength and power of the laser, the method selectively vaporizes the debris while minimizing damage to the lithography system. The vaporized debris is then effectively removed, enhancing the overall performance of the system.

Career Highlights

Chun-Han Lin is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work has been instrumental in advancing lithography technologies, which are crucial for semiconductor manufacturing. His expertise in this area has positioned him as a key figure in the industry.

Collaborations

Chun-Han Lin collaborates with talented individuals such as Chieh Hsieh and Sheng-Kang Yu. Together, they work on innovative solutions that push the boundaries of current technologies.

Conclusion

Chun-Han Lin's contributions to EUV lithography through his patents and collaborations highlight his importance in the field of semiconductor technology. His innovative methods for debris removal are paving the way for more efficient lithography systems.