This inventor holds 7 USPTO granted patents and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2022-2025.
Location History:
- Kaohsiung, TW (2023)
- Hsinchu, TW (2022 - 2024)
Company Filing History:
Years Active: 2022-2025
Title: The Innovations of Chun-Fu Yang
Introduction
Chun-Fu Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work primarily focuses on methods that enhance the efficiency and effectiveness of photomasks used in extreme ultraviolet lithography.
Latest Patents
One of his latest patents is titled "Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask." This patent describes a method for patterning a semiconductor wafer using extreme ultraviolet lithography (EUVL). The process involves receiving an EUVL mask that consists of a substrate with low temperature expansion material, a reflective multilayer, a capping layer, and an absorber layer. The method includes patterning the absorber layer to create a trench, which is then treated with oxygen plasma to achieve a desired width. Additionally, nitrogen plasma treatment is employed to protect the capping layer and ensure the trench reaches the target width.
Another notable patent is "Method of fabricating and servicing a photomask." This method involves placing a contaminated photomask in a plasma processing chamber, where it undergoes plasma processing to remove contamination. The plasma used can be either oxygen or hydrogen plasma, showcasing the innovative approaches Chun-Fu Yang employs in his work.
Career Highlights
Chun-Fu Yang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His expertise and innovative methods have contributed to advancements in photomask technology, which is crucial for the production of high-performance semiconductor devices.
Collaborations
Throughout his career, Chun-Fu Yang has collaborated with notable colleagues, including Pei-Cheng Hsu and Ta-Cheng Lien. These collaborations have further enhanced his research and development efforts in the semiconductor field.
Conclusion
Chun-Fu Yang's contributions to semiconductor technology through his innovative patents and collaborations highlight his significant role in advancing the industry. His work continues to influence the development of efficient and effective photomask technologies.