This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Chun-Da Liao in Semiconductor Technology
Introduction
Chun-Da Liao is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced transistor structures. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this highly technical domain.
Latest Patents
Chun-Da Liao holds a patent titled "Work-function metal in transistors and method forming same." This patent describes a method that includes forming a dummy gate stack over a semiconductor region, creating a source/drain region adjacent to the dummy gate stack, and subsequently removing the dummy gate stack to form a trench. The process involves forming a gate dielectric layer that extends into the trench and on the semiconductor region, followed by the deposition of a first work-function layer comprising metals such as ruthenium and molybdenum. The method further includes the deposition of a conductive filling layer and a planarization process to finalize the gate stack. This innovative approach enhances the performance and efficiency of transistors.
Career Highlights
Chun-Da Liao is currently employed at Taiwan Semiconductor Manufacturing Co., Ltd., a leading company in the semiconductor industry. His work at this prestigious organization has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.
Collaborations
Some of Chun-Da Liao's notable coworkers include Huang-Lin Chao and Hsin-Yi Lee. Their collaborative efforts in the field of semiconductor research have further propelled innovations and improvements in transistor technology.
Conclusion
Chun-Da Liao's contributions to semiconductor technology, particularly through his patent on work-function metals in transistors, highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced electronic devices, showcasing the importance of innovation in technology.