Chun-Ching Tsan

Title: Innovations of Chun-Ching Tsan

Introduction

Chun-Ching Tsan is a notable inventor based in Touliu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on improving processes and structures within chemical vapor deposition and integrated circuits.

Latest Patents

One of his latest patents is a method for improved cleaning in the HDP-CVD process with reduced NF3 usage. This method enhances the cleaning of residual materials from a chemical vapor deposition apparatus in situ by employing dry etching. The process begins with the deposition of silicon oxide layers on substrates using a high-density plasma chemical vapor deposition method. After the substrates are removed, the reactor chamber is sealed, filled with gas, and subjected to plasma formation. Oxygen is added, and the reactor is heated to facilitate an effective cleaning step using a reactive gas, resulting in greater cleaning efficiency.

Another significant patent involves a method and structure to improve the reliability of multilayer structures of FSG (F-doped SiO2) dielectric layers and metal layers in semiconductor integrated circuits. This innovation prevents delamination of FSG and allows it to be effectively used as the interlevel dielectric between conducting interconnection patterns in multilevel integrated circuit structures. The composite dielectric structure includes FSG, undoped silicon oxide, silicon-rich silicon oxide, and silicon nitride, with the silicon-rich layer preventing adverse reactions during manufacturing heat treatment cycles.

Career Highlights

Chun-Ching Tsan is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate and contribute to advancements in semiconductor technology. His expertise and inventions have played a crucial role in enhancing the reliability and efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Chun-Ching Tsan has collaborated with esteemed colleagues, including Ying-Lang Wang and Wen-Kung Cheng. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chun-Ching Tsan's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.