Chun C Lin

Title: The Innovative Contributions of Chun C Lin

Introduction

Chun C Lin is a prominent inventor based in Cupertino, CA, known for her significant contributions to the field of particle scanning systems. With a focus on enhancing inspection methods, she has developed innovative technologies that improve the accuracy and efficiency of substrate analysis.

Latest Patents

Chun C Lin holds a patent for an "Electron beam inspection system and method." This invention encompasses various embodiments of a method and apparatus designed for a particle scanning system and an automatic inspection system. The technology involves directing a particle beam at the surface of a substrate for scanning purposes. It includes a selection of detectors to identify secondary particles, back-scattered particles, and transmitted particles from the substrate. The substrate is mounted on an x-y stage, allowing for multiple degrees of freedom during scanning. Additionally, the system subjects the substrate to an electric field to accelerate secondary particles and features optical alignment means for precise positioning beneath the particle beam. The vacuum means incorporated in the system allows for efficient handling of substrates during inspection.

Career Highlights

Chun C Lin has made remarkable strides in her career, particularly through her work at Kla Instruments Corporation. Her innovative approach to particle scanning technology has positioned her as a leader in the field. With a patent portfolio that includes 1 patent, she continues to push the boundaries of what is possible in substrate inspection.

Collaborations

Chun has collaborated with notable colleagues, including Dan Meisburger and Alan D Brodie, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Chun C Lin's contributions to the field of particle scanning systems exemplify her dedication to advancing technology. Her innovative patent and collaborative efforts highlight her role as a key figure in the industry.