Taichung, Taiwan

Chuen-Lin Tien

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Feng Chia University. Active years: 2020-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chuen-Lin Tien. Retrieved from https://idiyas.com/inventor/chuen-lin-tien

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2020-2026

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2 patents (USPTO):Explore Patents

Title: Innovations by Chuen-Lin Tien in Optical Thin Films

Introduction

Chuen-Lin Tien is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of optical thin films, particularly in the measurement of residual stress. His innovative approach addresses the limitations of conventional measuring apparatuses.

Latest Patents

Chuen-Lin Tien holds a patent for a "System for measuring residual stress in optical thin films in both transmission and reflection." This invention overcomes the challenges faced by traditional optical-transmission and optical-reflection measuring devices. It allows for accurate measurement of residual stress in optical films that possess either light reflective properties or transparent/translucent characteristics. This advancement not only enhances measurement accuracy but also reduces costs associated with purchasing multiple measuring systems.

Career Highlights

Chuen-Lin Tien is affiliated with Feng Chia University, where he contributes to research and development in optical technologies. His work has garnered attention for its practical applications in various industries, including optics and materials science.

Conclusion

Chuen-Lin Tien's innovative contributions to the measurement of residual stress in optical thin films demonstrate his expertise and commitment to advancing technology in this field. His patent reflects a significant step forward in optical measurement techniques, benefiting both researchers and industries alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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