The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Nov. 28, 2018
Chuen-lin Tien, Taichung, TW;
Chuen-Lin Tien, Taichung, TW;
FENG CHIA UNIVERSITY, Taichung, TW;
Abstract
Conventional optical-transmission-type residual stress measuring apparatus cannot be used for completing the measurement of residual stress in an optical film having light reflective property, and conventional optical-reflection-type residual stress measuring apparatus is known failing to achieving the measurement of residual stress in an optical thin film having transparent or translucent property. In view of that, the present invention discloses a system for measuring residual stress in optical thin films, which is able to be utilized for achieving the residual stress measurement of respective optical thin film having transparent or translucent property and that of respective optical thin film having light reflective property. Therefore, it is helpful for largely reducing both the purchase cost and the maintenance cost by only purchasing the residual stress measuring system provided by the present invention instead of simultaneously purchasing the aforesaid two different types of residual stress measuring apparatuses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile