Hubei, China

Chuang MA

This inventor holds 1 USPTO granted patent. Top assignee: Yangtze Memory Technologies., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chuang MA. Retrieved from https://idiyas.com/inventor/chuang-ma-n49ow47o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Chuang MA - Innovator in Semiconductor Technology

Chuang MA is a prominent inventor based in Hubei, China. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs and patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

Chuang MA holds a patent for a semiconductor device with a staircase gate stack and sidewall isolation structure. This invention provides a novel approach to semiconductor design, incorporating a memory stack of gate layers and insulating layers. The gate layers and insulating layers are alternately stacked in a staircase configuration, which optimizes the device's performance. The patent details a first landing pad on the top gate layer of the first stair step, along with a sidewall isolation structure that effectively isolates the second gate layer from the first landing pad.

Career Highlights

Chuang MA is currently associated with Yangtze Memory Technologies, Ltd., where he continues to push the boundaries of semiconductor innovation. His work at the company has been instrumental in advancing memory technology, contributing to the development of high-performance semiconductor devices.

Conclusion

Chuang MA's contributions to semiconductor technology through his innovative patents and work at Yangtze Memory Technologies, Ltd. highlight his role as a key figure in the industry. His advancements in semiconductor design are paving the way for future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…