Company Filing History:
Years Active: 2004
Title: Innovations by Chuan-Yi Wang
Introduction
Chuan-Yi Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods that enhance the efficiency and reliability of integrated circuits.
Latest Patents
One of his latest patents is a "Method for detecting metal contamination on a silicon chip by implanting arsenic." This invention relates to implanting arsenic into a wafer to quickly detect metal contamination, such as iron, aluminum, or manganese. The method involves implanting arsenic ions into the silicon chip and etching it with a chemical solution. The presence of metal contamination is identified by observing silicon pits caused by the reaction between the arsenic ions and the contaminants.
Another significant patent is the "Method of making IC capacitor." This method includes providing a substrate, forming a polycide layer, and creating an insulating amorphous silicon layer that serves as an anti-reflection layer. The process further involves implanting n-type ions into the insulating layer to convert it into a conductive layer, followed by patterning to form a bottom electrode. A dielectric layer and a conductor layer are then added to complete the capacitor structure.
Career Highlights
Chuan-Yi Wang is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the semiconductor industry. His work has contributed to advancements in integrated circuit design and manufacturing.
Collaborations
He has collaborated with notable coworkers, including Tsai-Sen Lin and Chon-Shin Jou, who have also contributed to various projects within the company.
Conclusion
Chuan-Yi Wang's innovative patents and contributions to semiconductor technology highlight his role as a key inventor in the field. His work continues to influence advancements in integrated circuits and detection methods.