Hsinchu, Taiwan

Chuan-Chieh Lin


Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2023

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2 patents (USPTO):

Title: Innovations of Chuan-Chieh Lin in Capacitor Technology

Introduction

Chuan-Chieh Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in capacitor design and manufacturing. With a total of two patents to his name, Lin's work has the potential to enhance the efficiency and cost-effectiveness of capacitor production.

Latest Patents

Lin's latest patents include innovative designs that address common challenges in capacitor manufacturing. The first patent, titled "Capacitor Integrated Structure," describes a capacitor made using a wafer. This design features structural elevation portions that allow an electrode layer to extend along the surface profiles of these portions. This innovation aims to reduce the capacitor area, simplify the manufacturing process, and ultimately lower production costs. The second patent, "Capacitor Structure and Manufacturing Method Thereof," outlines a complex capacitor structure that includes a substrate, multiple electrodes, dielectric layers, and a stress balance layer. This design incorporates trenches and a pillar portion, optimizing the arrangement of the electrodes and dielectric layers to improve performance.

Career Highlights

Chuan-Chieh Lin is currently employed at Powerchip Semiconductor Manufacturing Corporation, where he continues to develop advanced semiconductor technologies. His work at this leading company has positioned him as a key player in the industry, contributing to innovations that drive efficiency and performance in semiconductor devices.

Collaborations

Lin collaborates with talented coworkers, including Wei-Yu Lin and Shih-Hao Cheng. Their combined expertise fosters a creative environment that encourages the development of groundbreaking technologies in the semiconductor field.

Conclusion

Chuan-Chieh Lin's contributions to capacitor technology exemplify the innovative spirit of modern inventors. His patents not only enhance manufacturing processes but also pave the way for future advancements in semiconductor technology.

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