Location History:
- Shanhua Jen, TW (2004)
- Tainan, TW (2005 - 2015)
Company Filing History:
Years Active: 2004-2015
Title: The Innovations of Chu-Sheng Lee
Introduction
Chu-Sheng Lee is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise. His work primarily focuses on improving processes in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Photoresist mask-free oxide define region (ODR)." This invention discloses a method for defining an oxide define region without the use of a photomask. The process involves depositing pad oxide and a stop layer over the peaks of a semiconductor wafer substrate. The pad oxide is typically silicon oxide, while the stop layer is made of silicon nitride. Following this, high-density plasma (HDP) oxide is deposited over the pad oxide, stop layer, and valleys of the substrate. A hard mask, such as silicon nitride, is then applied over the oxide, followed by the deposition of photoresist. The photoresist is etched back to expose the peaks of the hard mask, allowing for further etching through to the stop layer. The process concludes with chemical-mechanical planarization (CMP) on the remaining hard mask and oxide.
Another notable patent by Lee addresses "Polysilicon hard mask etch defect particle removal." This invention focuses on the removal of defect particles created during the etching of polysilicon hard masks. The method involves growing oxide in the polysilicon layer exposed through the patterned hard mask, which embeds the defect particles within the oxide. The oxide is then treated with an acidic solution, such as hydrofluoric acid, to eliminate both the oxide and the embedded defect particles.
Career Highlights
Chu-Sheng Lee is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Lee has collaborated with notable colleagues, including Chu-We Hu and Yu-Lung Yeh, contributing to advancements in semiconductor technology through teamwork and shared expertise.
Conclusion
Chu-Sheng Lee's innovative patents and contributions to the semiconductor industry highlight his role as a key inventor in this field. His work continues to influence the development of advanced manufacturing techniques, showcasing the importance of innovation in technology.