Chu-Hsiang Hsu

Title: The Innovations of Chu-Hsiang Hsu

Introduction

Chu-Hsiang Hsu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on enhancing semiconductor structures and manufacturing methods, which are crucial for the advancement of electronic devices.

Latest Patents

Hsu's latest patents include a semiconductor structure having an electrical contact. This patent describes a semiconductor structure that consists of a semiconductor substrate and a doped polysilicon contact. The doped polysilicon contact is strategically placed over the semiconductor substrate and includes a dopant material with a concentration of at least 10 atom/cm. Another notable patent is a method of manufacturing a semiconductor structure with an electrical contact. This method involves several steps, including providing a semiconductor substrate, forming a dielectric structure, filling a trench with polysilicon material, detecting defects, implanting dopant material, and annealing the polysilicon to create a doped contact.

Career Highlights

Throughout his career, Hsu has worked with notable companies such as Acer Inc. and Nan Ya Technology Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in semiconductor technology.

Collaborations

Hsu has collaborated with talented individuals in his field, including Chen-Hao Lien and Cheng-Yan Ji. These collaborations have fostered innovation and have led to the development of cutting-edge technologies.

Conclusion

Chu-Hsiang Hsu's contributions to semiconductor technology are noteworthy, and his patents reflect his innovative spirit. His work continues to influence the industry, paving the way for future advancements in electronic devices.