Christos Christou

Title: Christos Christou: Pioneer of Indirectly Heated Button Cathodes for Ion Sources

Introduction

Christos Christou, a distinguished inventor based in West Sussex, Great Britain, has made significant contributions to the field of ion implantation technology. With a keen focus on enhancing electron emission and plasma production, he holds one notable patent that showcases his innovative approach.

Latest Patents

Christou's patent, titled "Indirectly Heated Button Cathode for an Ion Source," offers a novel solution for improving the efficiency of ion sources used in ion implanters. The design features a button member consisting of a slug piece mounted in a collar piece, with provisions for thermal insulation. This setup allows the slug piece to operate at elevated temperatures, thereby enhancing electron emission and concentrating it over the surface of the slug piece. Additionally, the patent discusses the use of tungsten for both the slug and collar pieces, and the option of employing tantalum to achieve a lower thermionic work function. The concentrated plasma generated in the ion source enhances the production of higher charge state ions, particularly phosphorus, which is crucial for subsequent high-energy implantation processes.

Career Highlights

Christos Christou is associated with Applied Materials, Inc., a leading company in the semiconductor and materials engineering field. His work at this esteemed organization emphasizes his commitment to advancing technology in ion implantation, providing essential innovations that support the semiconductor manufacturing industry.

Collaborations

Throughout his career, Christou has collaborated with notable peers such as Marvin Farley and Takao Sakase. Their collective efforts and shared expertise have contributed to breakthroughs in ion source technology and have further solidified Christou's role as a key innovator in his field.

Conclusion

In summary, Christos Christou's invention of the indirectly heated button cathode for ion sources represents a significant advancement in ion implantation technology. His dedication and innovative spirit continue to influence the semiconductor industry, making him a noteworthy figure in the realm of inventions and patents.