Company Filing History:
Years Active: 2019-2021
Title: Christopher Snedigar: Innovator in Plasma Etch Processes
Introduction
Christopher Snedigar is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of plasma etching, holding 2 patents that showcase his innovative methods and technologies.
Latest Patents
One of his latest patents is focused on "Process window widening using coated parts in plasma etch processes." This technology involves a method of etching that includes mixing plasma effluents with a gas in a first section of a chamber to create a first mixture. The first mixture is then flowed to a substrate in a second section of the chamber, both sections utilizing nickel plated material. The method further reacts the first mixture with the substrate to selectively etch a first layer over a second layer. Additionally, it includes forming a second mixture from the products of this reaction.
Career Highlights
Christopher Snedigar is currently employed at Applied Materials, Inc., where he continues to develop and refine his innovative techniques in plasma etching. His work has contributed to advancements in the semiconductor manufacturing process, enhancing efficiency and precision.
Collaborations
Some of his notable coworkers include Dongqing Yang and Tien Fak Tan, with whom he collaborates on various projects within the company.
Conclusion
Christopher Snedigar's contributions to the field of plasma etching through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the technology sector. His innovative methods continue to shape the future of semiconductor manufacturing.