This inventor holds 1 USPTO granted patent. Top assignee: Ekc Technology Inc.. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Christopher Reid: Innovator in Semiconductor Cleaning Solutions
Introduction
Christopher Reid is a notable inventor based in Glasgow, GB. He has made significant contributions to the field of semiconductor technology, particularly in the area of cleaning solutions. His innovative approach has led to the development of a unique patent that addresses the challenges faced in semiconductor device maintenance.
Latest Patents
Christopher Reid holds a patent for "Aqueous phosphoric acid compositions for cleaning semiconductor devices." This invention relates to dilute aqueous solutions containing phosphoric acid, which are designed for cleaning plasma etch residue from semiconductor substrates. The solution may advantageously contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound. Additionally, it may include other components such as organic solvents, chelating agents, amines, and/or surfactants, enhancing its effectiveness in the cleaning process.
Career Highlights
Reid's career is marked by his work at EKC Technology Inc., where he has been instrumental in advancing cleaning technologies for the semiconductor industry. His expertise and innovative mindset have positioned him as a key player in this specialized field.
Collaborations
Throughout his career, Christopher has collaborated with talented individuals such as Douglas Holmes and Jerome Daviot. These partnerships have fostered a creative environment that encourages the development of cutting-edge solutions in semiconductor cleaning.
Conclusion
Christopher Reid's contributions to semiconductor cleaning technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the effectiveness of cleaning processes in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile