Christopher P Pannier

Title: Inventor Spotlight: Christopher P. Pannier

Introduction

Christopher P. Pannier is a notable inventor based in Ann Arbor, Michigan, renowned for his contributions to the field of nanofabrication. With one patent to his name, he has made significant strides in the realm of integrated electrohydrodynamic jet printing and spatial atomic layer deposition systems.

Latest Patents

Pannier's sole patent is titled "Integrated Electrohydrodynamic Jet Printing and Spatial Atomic Layer Deposition System for Area Selective-Atomic Layer Deposition." This innovative system incorporates an electrohydrodynamic jet printing station, featuring an E-jet printing nozzle and a spatial atomic layer deposition station with a zoned ALD precursor gas distributor. This distributor discharges linear zone-separated first and second ALD precursor gases, facilitating advanced nanofabrication processes. The ingenuity of his design lies in a heatable substrate plate that is dynamically supported on a motion actuator, enabling three-dimensional movement. Furthermore, the conveyor system allows the actuator to transition smoothly between the printing and deposition windows, enhancing the efficiency of area-selective atomic layer deposition methods.

Career Highlights

Christopher P. Pannier holds a position at the University of Michigan, where he engages in cutting-edge research that bridges the gap between printing technology and atomic layer deposition. His work exemplifies a commitment to advancing technologies that greatly benefit various applications in nanotechnology and materials science.

Collaborations

Pannier collaborates with fellow researchers and colleagues, including Mattison Rose and Kira Barton. These partnerships underscore the collaborative spirit within the research community at the University of Michigan, facilitating the exchange of ideas and fostering innovation.

Conclusion

In summary, Christopher P. Pannier stands out as a pioneering inventor whose work in electrohydrodynamic jet printing and atomic layer deposition showcases the potential of advanced manufacturing technologies. His contributions not only enhance the capabilities of nanofabrication but also open new avenues for research and development within the field.