Yardley, PA, United States of America

Christopher Michael Caroff

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Christopher Michael Caroff: Innovator in High Purity Tin Compounds

Introduction

Christopher Michael Caroff is a notable inventor based in Yardley, PA (US). He has made significant contributions to the field of chemistry, particularly in the development of high purity tin compounds. His innovative work has implications for advanced lithography techniques.

Latest Patents

Caroff holds a patent for "High purity tin compounds containing unsaturated substituent and method for preparation thereof." This patent describes monoorgano tin trialkoxide compounds with the chemical formula R'Sn(OR), which contain less than about 5 mol % diorgano tin dialkoxide. The compounds feature R′ as a linear or branched, optionally fluorinated, unsaturated hydrocarbon group with about 2 to about 20 carbon atoms, while each R is a linear or branched, optionally fluorinated, alkyl group with about 1 to about 10 carbon atoms. The methods for synthesizing and purifying these compounds are also detailed in the patent. These monoorgano tin compounds are particularly useful for forming high-resolution EUV lithography patterning precursors due to their high purity and minimal concentration of diorgano tin impurities.

Career Highlights

Throughout his career, Caroff has worked with prominent companies in the chemical industry. Notably, he has been associated with Gelest, Inc. and Mitsubishi Chemical Corporation. His experience in these organizations has contributed to his expertise in the development of innovative chemical compounds.

Collaborations

Caroff has collaborated with various professionals in his field, including his coworker Li Yang. These collaborations have likely enhanced his research and development efforts.

Conclusion

Christopher Michael Caroff is a distinguished inventor whose work in high purity tin compounds has advanced the field of chemistry. His contributions are significant for the future of lithography and material science.

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