Pflugerville, TX, United States of America

Christopher M Devany

This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher M Devany. Retrieved from https://idiyas.com/inventor/christopher-m-devany

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Christopher M Devany: Innovator in Semiconductor Technology

Introduction

Christopher M Devany is a notable inventor based in Pflugerville, TX (US). He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of etching systems.

Latest Patents

Devany holds a patent for a "Process for forming semiconductor device using beveled clamp fingers." This invention utilizes beveled clamp fingers in an etching system. The beveled top surfaces of the clamp fingers allow etching species to attack the layer being etched more readily at locations near the beveled clamp fingers. This innovation effectively reduces the size of halo regions. In alternative embodiments, triangular clamp fingers or clamp fingers with rounded top surfaces can also be employed.

Career Highlights

Christopher M Devany is associated with Motorola Corporation, where he has been instrumental in advancing semiconductor technologies. His work has contributed to the development of more efficient manufacturing processes in the electronics industry.

Collaborations

Devany has collaborated with Gregory S Ferguson, a fellow innovator in the field. Their partnership has fostered advancements in semiconductor device technology.

Conclusion

Christopher M Devany's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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