Hove, United Kingdom

Christopher J S Burgess

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2005-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher J S Burgess. Retrieved from https://idiyas.com/inventor/christopher-j-s-burgess

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2005-2009

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Christopher J S Burgess

Introduction: Christopher J S Burgess is a remarkable inventor based in Hove, GB. With two patents to his name, he has made significant contributions to the field of ion implantation technology. His work focuses on enhancing the efficiency of ion sources, which is critical in various industrial and research applications.

Latest Patents: One of Christopher J S Burgess's latest patents revolves around "Ion sources for ion implantation apparatus." This invention aims to improve the efficiency of ion flow from an ion source by minimizing heat loss. By lining the interior and exterior of the ion chamber with heat reflective and insulating materials, as well as designing an indirectly heated cathode tube with slits to restrict heat transfer, the efficiency of the ion source is significantly enhanced. Furthermore, the invention includes impregnating or coating the front plate of the ion chamber with a material containing elements that match the ions to be implanted into the substrate, ensuring optimal performance.

Career Highlights: Christopher J S Burgess is currently associated with Applied Materials, Inc., a leading company in the materials engineering industry. His expertise in ion implantation technology has positioned him as a key player in advancing innovations that support various manufacturing processes.

Collaborations: In his career, Christopher has worked alongside notable colleagues such as Adrian John Murrell and Richard David Goldberg. Their collaborative efforts have fostered a creative environment that encourages innovation and problem-solving in their field.

Conclusion: Christopher J S Burgess’s innovative spirit and technical expertise continue to push the boundaries of ion implantation technology. His patents not only reflect his commitment to efficiency but also underscore the vital role of collaboration in driving advancements within the industry. As he continues his work at Applied Materials, Inc., the impact of his inventions is sure to be felt across multiple sectors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…