Christopher J Mann

Title: Christopher J Mann: Innovator in Multi-Target Physical-Vapor Deposition

Introduction

Christopher J Mann is a notable inventor based in Danville, CA (US). He has made significant contributions to the field of material deposition technology. His innovative work focuses on enhancing the efficiency and effectiveness of multi-layer material structures.

Latest Patents

Mann holds a patent for an "Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure." This invention allows for the high-throughput deposition of structures, such as those used in GMR and MRAM applications. The apparatus features an indexing mechanism that aligns a substrate with multiple targets, facilitating the sequential deposition of various layers. Additionally, it includes a shutter mechanism that enhances deposition control and can preclean targets or substrates.

Career Highlights

Mann's career is marked by his dedication to advancing deposition technologies. His patent represents a significant step forward in the ability to deposit multiple layers of materials efficiently within a single vacuum chamber. This innovation is crucial for applications requiring precise material layering.

Collaborations

Mann has collaborated with esteemed colleagues, including Mehrdad M Moslehi and Cecil J Davis. Their combined expertise contributes to the development of cutting-edge technologies in the field.

Conclusion

Christopher J Mann's contributions to the field of physical-vapor deposition are noteworthy. His innovative patent demonstrates his commitment to advancing material science and technology. His work continues to influence the industry and pave the way for future innovations.