Montgomery, NY, United States of America

Christopher E Pepe


Average Co-Inventor Count = 7.5

ph-index = 1

Forward Citations = 13(Granted Patents)


Location History:

  • Middletown, NY (US) (2006)
  • Montgomery, NY (US) (2017)

Company Filing History:


Years Active: 2006-2017

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Christopher E Pepe: Innovator in Metrology and Semiconductor Fabrication

Introduction

Christopher E Pepe is a notable inventor based in Montgomery, NY (US). He has made significant contributions to the fields of metrology management and semiconductor fabrication. With a total of 2 patents, his work reflects a commitment to advancing technology and improving processes.

Latest Patents

One of Pepe's latest patents is focused on metrology management. This method involves managing a metrology system by receiving a part, identifying its type, and retrieving associated test rule logic from a database. The process includes analyzing measurement data and determining whether the part should be measured. If it is determined that the part should not be measured, the system outputs the part and increments a counter, saving the value in the database.

Another significant patent is for a method and apparatus for the rapid cooling of metal screening masks. This innovation is crucial in the fabrication of semiconductor components. The method utilizes a specially designed cooling plate that contacts the mask frame holding the screening mask. After a heated cleaning step, the cooling plate enhances thermal efficiency by ensuring intimate contact with the mask frame, thereby improving the cooling process.

Career Highlights

Christopher E Pepe is currently employed at International Business Machines Corporation (IBM). His role at IBM allows him to work on cutting-edge technologies and contribute to the company's innovative projects. His expertise in metrology and semiconductor fabrication has positioned him as a valuable asset within the organization.

Collaborations

Pepe has collaborated with notable coworkers, including William K Hoffman, Jr and Timothy L Holmes. These collaborations have likely fostered an environment of innovation and creativity, leading to the development of impactful technologies.

Conclusion

Christopher E Pepe's contributions to metrology management and semiconductor fabrication demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of complex systems and a commitment to improving industrial processes.

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