Christopher Brown

Title: Christopher Brown: Innovator in Droplet and Plasma Targeting Technology

Introduction

Christopher Brown is an accomplished inventor based in Orlando, FL. He has made significant contributions to the field of EUV source technology through his innovative patent. His work focuses on advanced methods and systems for tracking and controlling droplets used in this technology.

Latest Patents

Christopher Brown holds a patent for an "Advanced droplet and plasma targeting system." This invention encompasses methods, systems, apparatus, and devices designed for tracking, controlling, and providing feedback on droplets utilized in EUV source technology. The system effectively tracks and corrects the positions of droplet targets and generated plasma. It includes generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, and comparing these coordinates to a set optimal position. If a deviation occurs, the system moves the generated target back to the optimal position. The optical imaging step involves activating a light source to image the generated target, with the light source strobed at a rate that matches droplet production for effective stroboscopic imaging. The movement of the target can be accomplished mechanically or electronically under computer control.

Career Highlights

Christopher is affiliated with the University of Central Florida Research Foundation, Inc., where he continues to advance his research and development efforts. His innovative work has garnered attention in the field, showcasing his expertise and commitment to technological advancement.

Collaborations

Some of Christopher's notable coworkers include Robert Bernath and Joshua Duncan. Their collaborative efforts contribute to the ongoing research and development in droplet and plasma targeting technologies.

Conclusion

Christopher Brown is a notable inventor whose work in droplet and plasma targeting technology has the potential to significantly impact the field of EUV source technology. His innovative patent reflects his dedication to advancing scientific knowledge and practical applications.