Christopher Bohn

Title: Innovations by Christopher Bohn in Semiconductor Fabrication

Introduction

Christopher Bohn is an accomplished inventor based in Santa Monica, CA. He has made significant contributions to the field of semiconductor device fabrication. With a total of two patents to his name, Bohn's work focuses on enhancing the precision and efficiency of electron beam lithography processes.

Latest Patents

Bohn's latest patents include innovative methods for fabricating semiconductor devices using multi-level electron beam lithography. One of his notable inventions is an embedded high-Z marker material and process for alignment in multilevel e-beam lithography. This invention involves forming an alignment marker in a substrate, which includes tantalum. The method utilizes a backscatter electron detector to determine the location of the edge of the alignment marker based on atomic number contrast. This precision allows for the accurate formation of transistors in the substrate, significantly improving the fabrication process.

Career Highlights

Christopher Bohn is currently employed at HRL Laboratories, LLC, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced techniques that enhance the capabilities of electron beam lithography.

Collaborations

Bohn collaborates with talented individuals in his field, including Maxwell Choi and Sieu Ha. Their combined expertise contributes to the innovative projects at HRL Laboratories.

Conclusion

Christopher Bohn's contributions to semiconductor fabrication through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.