This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Sefar Ag. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Heiden, CH (2018)
- Schachen b. Reute, CH (2018)
Company Filing History:
Years Active: 2018
Title: The Innovative Contributions of Christian Gurtner
Introduction
Christian Gurtner is a notable inventor based in Heiden, Switzerland. He has made significant contributions to the field of material-removing machining through his innovative patents. With a total of 2 patents, Gurtner's work focuses on enhancing the efficiency and effectiveness of filter devices used in machining processes.
Latest Patents
Gurtner's latest patents include a "Filter means and filter element for treating a flushing liquid for material-removing machining" and a "Method for material-removing machining." The first invention relates to a filter device designed to treat a rinsing liquid used in material-removing machining. This filter device features a filter element that allows the rinsing liquid to pass through, effectively separating removed material particles. To enhance the service life of the filter, the element is equipped with a filter fabric that has distinctive longitudinal slots, achieving a length-to-width ratio of ≥4:1. The second patent describes a filter medium that consists of a filter fabric on the upper side and a support fabric on the lower side. Both fabrics are woven together in a double weave, with the filter fabric boasting a pore count of 4000/cm² or greater, preferably 5000/cm².
Career Highlights
Christian Gurtner has established himself as a key figure in his field, working at Sefar AG, a company known for its expertise in filtration solutions. His innovative approach to filter design has contributed to advancements in machining processes, making them more efficient and reliable.
Collaborations
Gurtner collaborates with talented individuals such as Isabell Erlenmaier and Christian Dietmayer, who share his commitment to innovation and excellence in their respective fields.
Conclusion
Christian Gurtner's contributions to the field of material-removing machining through his patents demonstrate his dedication to innovation and improvement. His work continues to influence the industry, paving the way for more efficient machining processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile