The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2018
Filed:
Jun. 26, 2014
Applicant:
Sefar Ag, Heiden, CH;
Inventors:
Isabell Erlenmaier, St. Gallen, CH;
Christian Dietmayer, Lindau, DE;
Christian Gurtner, Heiden, CH;
Christoph Maurer, Zurich, CH;
Assignee:
Sefar AG, Heiden, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 39/08 (2006.01); D03D 1/00 (2006.01); B24B 55/12 (2006.01); B01D 35/02 (2006.01);
U.S. Cl.
CPC ...
B01D 39/083 (2013.01); B01D 35/02 (2013.01); B01D 39/086 (2013.01); B24B 55/12 (2013.01); D03D 1/00 (2013.01); B01D 2239/0654 (2013.01); B01D 2239/1216 (2013.01); B01D 2239/1291 (2013.01);
Abstract
The invention relates to a filter device for treating a rinsing liquid for material-removing machining, said filter device having a filter element through which the rinsing liquid can be conducted for separating removed material particles. In order to increase the service life, the filter element is provided with a filter fabric, on the filtration upper side of which are formed fabric pores in the form of distinctive longitudinal slots which have a ratio of length to width of ≥4:1.