The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Feb. 17, 2014
Applicant:
Sefar Ag, Heiden, CH;
Inventors:
Isabell Erlenmaier, St. Gallen, CH;
Christoph Maurer, Zurich, CH;
Christian Gurtner, Schachen b. Reute, CH;
Christian Dietmayer, Lindau, DE;
Assignee:
Sefar AG, Heiden, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 39/08 (2006.01); B01D 33/048 (2006.01); B01D 33/04 (2006.01); D03D 1/00 (2006.01); D03D 11/00 (2006.01); D03D 13/00 (2006.01); D03D 15/00 (2006.01);
U.S. Cl.
CPC ...
B01D 39/08 (2013.01); B01D 33/042 (2013.01); B01D 33/048 (2013.01); D03D 1/00 (2013.01); D03D 11/00 (2013.01); D03D 13/004 (2013.01); D03D 15/0094 (2013.01); B01D 2239/0654 (2013.01); D10B 2505/04 (2013.01);
Abstract
The invention relates to a filter medium having a filter fabric on an upper side and a support fabric on a lower side, wherein the filter fabric and the support fabric have different yams and together take the form of a double weave, wherein the filter fabric has a pore count of 4000/cm2 or greater, preferably 5000/cm2.