Christian Ebi

Title: Christian Ebi: Innovator in Particle Beam Lithography

Introduction

Christian Ebi is a notable inventor based in Haimhausen, Germany. He has made significant contributions to the field of particle beam lithography, particularly through his innovative methods that enhance the precision and efficiency of this technology. With one patent to his name, Ebi's work is recognized for its potential to improve manufacturing processes in various industries.

Latest Patents

Ebi's patent, titled "Method for compensating for scatter/reflection effects in particle beam lithography," outlines a novel approach to mitigate the challenges associated with scatter and reflection in particle beam applications. The method involves providing at least one layer of a material sensitive to particle beams, utilizing a particle beam to write predetermined patterns in a limited area, and writing a surrounding frame to ensure a more homogeneous background dose. This innovation allows for a reduction in variations in critical dimensions, making the process more cost-effective and efficient.

Career Highlights

Christian Ebi is currently employed at Infineon Technologies AG, where he continues to develop and refine technologies related to particle beam lithography. His expertise in this area has positioned him as a valuable asset to his team and the broader field of semiconductor manufacturing.

Collaborations

Ebi collaborates with talented professionals such as Frank Erber and Torsten Franke, who contribute to the advancement of their shared goals in technology and innovation.

Conclusion

Christian Ebi's contributions to particle beam lithography exemplify the impact of innovative thinking in technology. His patent reflects a commitment to enhancing manufacturing processes, showcasing the importance of research and development in driving industry advancements.