Company Filing History:
Years Active: 2016-2025
Title: The Innovative Contributions of Christian Dussarrat
Introduction
Christian Dussarrat is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced thin film technologies. With a total of 8 patents to his name, Dussarrat's work has implications for various applications in electronics and materials engineering.
Latest Patents
Dussarrat's latest patents include innovative processes for forming indium-containing films and lithium-containing layers. One of his key patents describes a method for forming an indium-containing film on a substrate. This process involves placing a substrate into a chamber, introducing a vapor that includes an indium-containing compound, and purging the chamber with gases to achieve the desired film thickness at controlled temperatures. Another significant patent focuses on methods for forming lithium-containing films, islets, or clusters on a substrate using silicon-free lithium precursors through vapor deposition methods.
Career Highlights
Throughout his career, Christian Dussarrat has worked with prominent companies such as Air Liquide Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude. His experience in these organizations has allowed him to refine his expertise in chemical processes and materials development.
Collaborations
Dussarrat has collaborated with several professionals in his field, including Masahiro Suzuki and Antoine Bruneau. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Christian Dussarrat's innovative work in the field of materials science has led to significant advancements in thin film technologies. His contributions continue to influence the industry and pave the way for future innovations.