Langebrueck, Germany

Christian Buergel


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 20(Granted Patents)


Location History:

  • Dresden, DE (2012)
  • Langebrueck, DE (2016)

Company Filing History:


Years Active: 2012-2016

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2 patents (USPTO):

Title: The Innovations of Christian Buergel

Introduction

Christian Buergel is a notable inventor based in Langebrueck, Germany. He has made significant contributions to the field of photomask manufacturing, holding two patents that showcase his innovative approach to shape metrology and particle beam writing methods.

Latest Patents

One of his latest patents is titled "Shape Metrology for Photomasks." This invention involves a method of manufacturing a photomask that includes forming a mask pattern with a critical mask feature. The process entails obtaining shape information that describes the outline of the critical mask feature, which includes position information identifying the positions of landmarks on the outline relative to each other. This shape information enables a metrology approach that is not solely based on rectangular approximations of mask features.

Another significant patent is the "Particle Beam Writing Method, Particle Beam Writing Apparatus and Maintenance Method for Same." This invention determines a first exposure dose for a shot area based on layout data. It also includes a correction dose that compensates for a dose deviation between two points in time, ensuring that the charged particle beam reaches a nominal current density at the target substrate.

Career Highlights

Christian Buergel has worked with Advanced Mask Technology Center GmbH & Co. KG, where he has applied his expertise in photomask technology. His work has contributed to advancements in the precision and efficiency of photomask manufacturing processes.

Collaborations

Throughout his career, Christian has collaborated with notable professionals in the field, including Martin Sczyrba and Eugen Foca. These collaborations have further enriched his work and contributed to the development of innovative technologies in photomask manufacturing.

Conclusion

Christian Buergel's contributions to the field of photomask technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in manufacturing processes.

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