The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Oct. 26, 2009
Applicants:
Martin Sczyrba, Dresden, DE;
Christian Buergel, Dresden, DE;
Eugen Foca, Radebeul, DE;
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A first exposure dose for a shot area based upon layout data is determined. A correction dose compensating a dose deviation between a first point in time, at which a control unit configured to control a shot time period of a particle beam writing apparatus considers a charged particle beam as having reached a nominal current density, and a second point in time, at which the charged particle beam has actually reached a nominal current density, at a target substrate is determined.
Quick Actions:
Sczyrba, Martin. (2012). Particle beam writing method, particle beam writing apparatus and maintenance method for same (U.S. Patent No. 8257888). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8257888
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