Eugen Foca

Title: The Innovative Contributions of Eugen Foca

Introduction

Eugen Foca is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of particle beam technology, particularly through his innovative patent. His work is characterized by a focus on precision and efficiency in particle beam writing methods.

Latest Patents

Eugen Foca holds a patent for a "Particle beam writing method, particle beam writing apparatus and maintenance method for same." This invention involves determining a first exposure dose for a shot area based on layout data. Additionally, it includes a correction dose that compensates for a dose deviation between two critical points in time, ensuring that the charged particle beam reaches a nominal current density at the target substrate.

Career Highlights

Eugen Foca is associated with Advanced Mask Technology Center GmbH & Co. KG, where he applies his expertise in particle beam technology. His work has been instrumental in advancing the capabilities of particle beam writing, which is essential for various applications in semiconductor manufacturing.

Collaborations

Eugen has collaborated with talented coworkers such as Martin Sczyrba and Christian Buergel. Their combined efforts contribute to the innovative environment at their workplace, fostering advancements in technology.

Conclusion

Eugen Foca's contributions to particle beam technology exemplify the impact of innovation in the field. His patent and collaborative efforts highlight the importance of precision in modern technological applications.