Traunwalchen, Germany

Christian Baeuml


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2018

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2 patents (USPTO):Explore Patents

Title: Christian Baeuml: Innovator in Optical Position-Measuring Devices

Introduction

Christian Baeuml is a notable inventor based in Traunwalchen, Germany. He has made significant contributions to the field of optical position-measuring devices, holding a total of 2 patents. His work focuses on enhancing the precision and functionality of measurement technologies.

Latest Patents

One of his latest patents is an "Optical position-measuring device having grating fields with different step heights." This innovative device includes a scale and a scanning reticle, allowing for the determination of relative positions in three linearly independent spatial directions using interfering light beams. The design features a splitter grating on the scanning reticle that splits light into sub-beams of different diffraction orders. Additionally, an optical grating on the scale further splits the sub-beams and recombines them after reflection from the scanning reticle. The grating fields, configured as phase gratings, influence the sub-beams and have varying step heights. Another patent is for an "Optical layer system" for a position-measuring device, which consists of multiple functional surfaces on a transparent substrate, each serving a different optical function.

Career Highlights

Christian Baeuml is associated with Dr. Johannes Heidenhain GmbH, a company known for its advancements in measurement technology. His work has contributed to the development of high-precision optical systems that are essential in various industrial applications.

Collaborations

He has collaborated with notable coworkers, including Peter Speckbacher and Stefan Funk, who have also contributed to the field of optical measurement technologies.

Conclusion

Christian Baeuml's innovative work in optical position-measuring devices showcases his expertise and commitment to advancing measurement technology. His patents reflect a deep understanding of optical systems and their applications in precision measurement.

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